Iker Uranga has won the Best Student Paper Award in the category Novel Patterning Technologies with “Combination of thermal scanning probe lithography and directed self-assembly of block copolymers”. This award recognizes students’ invaluable contributions to the patterning community and is sponsored by Meta.
Iker attended the Society For Optics & Photonics (SPIE) Advanced Lithography + Patterning Congress in San Jose (California, US) on 23-27 February 2025. With more than 2200 attendees, it is the most important conference in the field of lithography for micro- and nanoelectronics. This paper is part of a collaboration between IMB-CNM and the École Polytechnique Fédérale de Lausanne (EPFL).
Best Student Paper Award at SPIE Advanced Lithography + Patterning Conference
