A team from the NANONEMS group, led by Marta Fernández-Regúlez, Joan Bausells and Francesc Pérez-Murano, has developed a new fabrication process based on CMOS (complementary metal–oxide–semiconductor) technology. This process achieves nanometer-scale resolution by combining advanced top-down and bottom-up nanofabrication techniques. The method is currently under evaluation for an European patent.
More information in: https://www.imb-cnm.csic.es/en/outreach/news/innovative-imb-cnm-method-enables-semiconductor-qubit-fabrication-using-standard